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Key terms: nm wafer lithography layer mask photoresist wavelength pattern exposure na optical contact etching developer gap substrate liquid ultraviolet projection resolution wet plasma beam feature size photolithography exposed immersion lithography printing spectrum proximity thickness photomask optical lithography photo resist wafer surface onto the wafer minimum feature exposure systems numerical aperture data file lithography wavelength sodium adhesion deep ultraviolet lens fabrication spin coating sizes entire wafer lambda Search external links cited by footnotes on Wikipedia page Photolithography: |
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