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Key terms: nm wafer lithography mask layer na optical gap photoresist wavelength pattern exposure developer contact etching wet chemical beam liquid exposed projection substrate printing ultraviolet plasma lens uniform resolution thickness changing sodium spectrum lambda proximity procedure photolithography adhesion data file photo resist wafer surface immersion lithography onto the wafer exposure systems spin coating entire wafer optical lithography minimum feature size deep ultraviolet numerical aperture lithography wavelength Search external links cited by footnotes on Wikipedia page Photolithography: |
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